Performance of the improved JBX-9000MV e-beam lithography system

Tadashi Komagata; Yasutoshi Nakagawa; Nobuo Gotoh; Kazumitsu Tanaka

doi:10.1117/12.436697

20 August 2001 Performance of the improved JBX-9000MV e-beam lithography system

Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436697
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

An electron beam mask writing system JBX-9000MV for 150- 190nm technical node masks was improved to cope with the production of masks for 130nm technology node. Some of the new technologies developed for the improvement and their results are reported in this paper.

Citation Download Citation

Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, and Kazumitsu Tanaka "Performance of the improved JBX-9000MV e-beam lithography system", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436697

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available