20 August 2001 Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation
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Abstract
In this work, ablative and gas capillary discharges have been investigated as potential sources for the EUV lithography technology. Carbon and lithium ablative discharge spectroscopy and EUV energy measurements have been performed. Gas (O2, Ne, Ar, Kr and Xe) capillary discharge were powered by fast, nanosecond, high voltage Blumlein-like pulser. Detailed investigation of capillary length and diameter, gas pressure, capacitance and inductance of the electrical driver are documented. The energy density, expressed in J cm-3, appears as a monitoring factor for an efficient production of 13.5 nm radiation band. The measurement and the evaluation of measurement uncertainties lead to the conclusion that the in band, 13.5 nm +/- 0.9 nm, energy radiated by the Xe lamp developed in this work ranges from 0.5 mJ/sr/shot to 20 mJ/sr/shot for a 7 J energy input. Repetition rate investigation of the first prototype have shown operation at 50 Hz in continuous mode and up to 350 Hz in burst mode.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Robert, Eric Robert, Branimir M. Blagojevic, Branimir M. Blagojevic, Remi Dussart, Remi Dussart, Smruti R. Mohanty, Smruti R. Mohanty, Moulay M. Idrissi, Moulay M. Idrissi, Dunpin Hong, Dunpin Hong, Raymond Viladrosa, Raymond Viladrosa, Jean-Michel Pouvesle, Jean-Michel Pouvesle, Claude Fleurier, Claude Fleurier, Christophe Cachoncinlle, Christophe Cachoncinlle, } "Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436689; https://doi.org/10.1117/12.436689
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