Paper
20 August 2001 Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
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Abstract
A theoretical comparison between the linear absorption coefficients at EUV wavelengths of 13 nm and 11 nm for more than 140 polymers revealed that the absorbance of organic polymers at 11 nm is ~30% lower than that at 13 nm. IN addition, the effects of oxygen content and density on the absorbance at 13 nm was theoretically investigated for organic polymers containing oxygen atoms. This investigation showed that, for organic polymers with about half the oxygen content of Novolak, the transmittance is 50% at a thickness of 200 nm and 60% at 140 nm. This further means that at 11 nm, the transmittance of the polymers should be 60% at 200 nm and 70% at 140 nm. These results suggest that a single-layer resist (SLR) process may very well be suitable for EUV resist processes. Further theoretical studies on silicon-containing polymers showed that, for a thickness of 200 nm and a wavelength of 13 nm, the transmittance would be in the range of 40-45% for silsequioxane polymers with some organic hydrocarbon parts, and in the range of 45-50% for siloxane polymers with some organic hydrocarbon parts.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobuyuki N. Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki, and Akihiko Ishitani "Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436657
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Cited by 3 scholarly publications.
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KEYWORDS
Polymers

Absorption

Oxygen

Chemical species

Silicon

Transmittance

Extreme ultraviolet

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