24 August 2001 Continuous metal removal technique for resist resins
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Modern resists require very pure raw materials to insure highest quality images. Many methods have been developed to reduce metals in resins used to make photoresists. Extractive washing techniques and ion exchange methods have been the predominant methods used to reduce metal levels for these critical raw materials. This has been especially important for the novolak resins because of the generally poor quality of the starting materials used to make them and by the nature of the resin isolation steps traditionally used. Both of the commonly used cleaning methods are time consuming and are predominantly batch processes. Based upon techniques developed to efficiently fractionate resins, we have developed a technique for the rapid, continuous reduction of metal contaminants in film forming resin solutions by an extractive method using a double inlet liquid/liquid centrifuge.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stan F. Wanat, Stan F. Wanat, Douglas S. McKenzie, Douglas S. McKenzie, M. Dalil Rahman, M. Dalil Rahman, } "Continuous metal removal technique for resist resins", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436877; https://doi.org/10.1117/12.436877

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