Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis M. Houlihan; Zhenglin Yan; Elsa Reichmanis; Gary Dabbagh; Kevin J. Bolan; Omkaram Nalamasu; Ilya L. Rushkin; Ognian N. Dimov

doi:10.1117/12.436904

24 August 2001 Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis M. Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin J. Bolan, Omkaram Nalamasu, Ilya L. Rushkin, Ognian N. Dimov

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Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436904
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We report on a lithographic study of the behavior of non- cholate tert-butylcarboxylate dissolution inhibitor (DI's) formulated in a poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate) 193 nm single layer resin. A comparision is made between formulations containing non- cholate DI's, cholate based DI's and formulations containing blends of the two different types of DI's. It was found that formulations containing the non-cholate materials tended to give T-topped profiles while the formulations containing cholate based materials and blends containing as little as 1% cholate based DI did not.

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Francis M. Houlihan, Francis M. Houlihan, Zhenglin Yan, Zhenglin Yan, Elsa Reichmanis, Elsa Reichmanis, Gary Dabbagh, Gary Dabbagh, Kevin J. Bolan, Kevin J. Bolan, Omkaram Nalamasu, Omkaram Nalamasu, Ilya L. Rushkin, Ilya L. Rushkin, Ognian N. Dimov, Ognian N. Dimov, "Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436904; https://doi.org/10.1117/12.436904

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