24 August 2001 Novel CA resists with photoacid generator in polymer chain
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Abstract
Novel chemically amplified resists with photoacid generating units in the polymer chains were synthesized and their lithographic properties evaluated under both 248nm and 20keV electron exposures. The positive-tone CA resists were found to exhibit excellent film formation behavior and extremely high sensitivity.
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Hengpeng Wu, Hengpeng Wu, Kenneth E. Gonsalves, Kenneth E. Gonsalves, } "Novel CA resists with photoacid generator in polymer chain", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436884; https://doi.org/10.1117/12.436884
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