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14 September 2001 Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks
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Abstract
Besides halftone phase shifting masks (HTPSM) in combination with off-axis illumination alternating phase shifting masks (altPSM) are becoming more and more an important resolution enhancement technique. Their obvious benefits can only yield profit in production if certain mask properties like intensity and phase balance are controlled to a requisite extent. In order to achieve production capable masks within a reasonable time and cost frame simulation tools are of essential importance for mask development and manufacturing. Four our studies we employed solid-CMTM, a 3D EMF (electro magnetic field) simulator that handles arbitrary topographical masks. It is demonstrated by examples that these capabilities are mandatory for altPSM development. In this paper we discuss the effects of various issues relevant for development and manufacturing of altPSM on a basis of systematic 3D EMF simulations. For different balancing options sensitivity to phase errors, mask CD errors and pitch/feature size were investigated. Comparisons to 2D simulation are made for further illustration. We show the influence of certain mask errors on process window and draw conclusions for optimizing altPSM manufacturing.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Armin Semmler, Leonhard Mader, Annika Elsner, Roderick Koehle, Uwe A. Griesinger, and Christoph Noelscher "Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435735
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