14 September 2001 High-resolution multigrating spectrometer for high-quality deep-UV light source production
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Deep UV lithography using ArF excimer laser requires very narrower spectral properties. However, spectrometers that have sufficient resolution to evaluate the ArF excimer laser are commercially not available. High-resolution multi-grating spectrometers for measuring spectral bandwidth at full width at half maximum (FWHM) and spectral purity of ArF excimer lasers are introduced. To achieve high resolution, a special grating arrangement called HEXA (Holographic and Echelle Gratings Expander Arrangement) is designed. A holographic grating and an echelle grating are used so that the input light is expanded and diffracted several times. The resolution of the HEXA spectrometer is more than two million. To evaluate the resolution and the stability of the spectrometer, we measured the instrument function by a coherent light source whose wavelength is same as ArF excimer laser. The experimentally obtained resolution of the spectrometer is 0.09pm or 0.05pm that is selectable. The measured dispersion has a good agreement with the theoretical value. To evaluate the spectral properties of excimer lasers, the instrument function must be very stable. This high-resolution spectrometer enables high quality control of line-narrowed ArF excimer laser mass production.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toru Suzuki, Toru Suzuki, Hirokazu Kubo, Hirokazu Kubo, Takashi Suganuma, Takashi Suganuma, Toshio Yamashita, Toshio Yamashita, Osamu Wakabayashi, Osamu Wakabayashi, Hakaru Mizoguchi, Hakaru Mizoguchi, } "High-resolution multigrating spectrometer for high-quality deep-UV light source production", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435662; https://doi.org/10.1117/12.435662


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