How lens aberrations influence lithographic imaging and how to reduce their effects

Gerhard Kunkel; Wolfgang Henke; Ina Voigt

doi:10.1117/12.435679

14 September 2001 How lens aberrations influence lithographic imaging and how to reduce their effects

Gerhard Kunkel, Wolfgang Henke, Ina Voigt

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435679
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A method is described to assess the influence of lens aberrations on the image by analyzing the interaction of specific aberrations and diffraction patterns resulting from corresponding mask structures. In order to establish a correlation between the amplitude of individual diffraction orders and specific aberrations, the sensitivity of each diffraction order is investigated separately. The resulting information is used in order to find means to reduce the influence of the aberrations on the diffraction pattern. Several possibilities such as various mask biases, serifs and non-printable assist features can either enhance or decrease the sensitivity to specific aberrations. This method of diffraction order sensitivity study is described and experimentally tested.

Citation Download Citation

Gerhard Kunkel, Wolfgang Henke, and Ina Voigt "How lens aberrations influence lithographic imaging and how to reduce their effects", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435679

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