14 September 2001 LAVA web-based remote simulation: enhancements for education and technology innovation
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Proceedings Volume 4346, Optical Microlithography XIV; (2001); doi: 10.1117/12.435691
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States
Abstract
The Lithography Analysis using Virtual Access (LAVA) web site at http://cuervo.eecs.berkeley.edu/Volcano/ has been enhanced with new optical and deposition applets, graphical infrastructure and linkage to parallel execution on networks of workstations. More than ten new graphical user interface applets have been designed to support education, illustrate novel concepts from research, and explore usage of parallel machines. These applets have been improved through feedback and classroom use. Over the last year LAVA provided industry and other academic communities 1,300 session and 700 rigorous simulations per month among the SPLAT, SAMPLE2D, SAMPLE3D, TEMPEST, STORM, and BEBS simulators.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo H. Croffie, Yunfei Deng, Frank E. Gennari, Thomas V. Pistor, Garth Robins, Mike V. Williamson, Bo Wu, Lei Yuan, Andrew R. Neureuther, "LAVA web-based remote simulation: enhancements for education and technology innovation", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435691; https://doi.org/10.1117/12.435691
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Printing

Java

Photomasks

Diffusion

Near field

Computer simulations

Optical simulations

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