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14 September 2001 Marathon evaluation of optical materials for 157-nm lithography
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Abstract
In this work we present progress on the long-term evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in-situ lamp-based cleaning. We review the current status of bulk materials for lenses, such as CaF2 and BaF2, and durability results of antireflectance coatings. Finally, we describe progress on materials testing of organic pellicles, both with 172-nm lamps as well as under 157-nm laser irradiation.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir Liberman, Mordechai Rothschild, N. N. Efremow Jr., Stephen T. Palmacci, Jan H. C. Sedlacek, Chris K. Van Peski, and Kevin J. Orvek "Marathon evaluation of optical materials for 157-nm lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435759
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