14 September 2001 New projection lens system for KrF exposure scanning tool
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Abstract
In this paper we review our newly developed high NA projection lens for KrF scanner (NSR-S205C.) The projection lens has 0.75 NA and small residual aberration. In a designing step, aspherical surfaces are utilized to decrease lens dimensions without degradation of the lens performance. Actual lens performance, which includes wavefront aberration, distortion, image plane flatness and resist profiles, is reviewed.
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Tomoyuki Matsuyama, Tomoyuki Matsuyama, Junichi Misawa, Junichi Misawa, Yuichi Shibazaki, Yuichi Shibazaki, } "New projection lens system for KrF exposure scanning tool", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435753; https://doi.org/10.1117/12.435753
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