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14 September 2001 Optical design forms for DUV and VUV microlithographic processes
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Abstract
Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic processes. Refractive and catadioptric design solutions using fused silica, calcium fluoride and other crystals are discussed. Several reflective and catadioptric design forms having central obscurations will be compared to refractive forms. Design complexity, performance and limitations are compared.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James E. Webb, Julie Bentley, Paul F. Michaloski, Anthony R. Phillips, and Ted Tienvieri "Optical design forms for DUV and VUV microlithographic processes", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435754; https://doi.org/10.1117/12.435754
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