14 September 2001 Present status of development of gas-purging and chemically clean technologies at ASET
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Purging and contamination are two important issues that need to be treated in order to realize F2 laser lithography system. For the purpose of developing gas-purging and chemically clean technologies, we designed and constructed an experimental set-up. It is used for the study of purging and out-gassing evaluation in order to obtain useful data for development of exposure system. Preliminary experiments showed that purging condition has a strong effect on the residual oxygen and water concentration in the final gas-replaced atmosphere. And we have found that the amount of out-gas depends on the surface finish method of the material used through analyses of impurity gas examination with or without laser irradiation.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuaki Fukuda, Yasuaki Fukuda, Seiji Takeuchi, Seiji Takeuchi, Takashi Aoki, Takashi Aoki, Soichi Owa, Soichi Owa, Fumika Yoshida, Fumika Yoshida, Youichi Kawasa, Youichi Kawasa, Akira Sumitani, Akira Sumitani, Keiji Egawa, Keiji Egawa, Takehito Watanabe, Takehito Watanabe, Kiyoharu Nakao, Kiyoharu Nakao, } "Present status of development of gas-purging and chemically clean technologies at ASET", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435763; https://doi.org/10.1117/12.435763

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