12 April 2001 Growth of laser-initiated damage in fused silica at 351 nm
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Abstract
The effective lifetime of optics in the UV is limited both by laser induced damage and the subsequent growth of laser initiated damage sites. We have measured the growth rate of laser induced damage in fused silica in both air and vacuum. The data shows exponential growth in the lateral size of the damage site with shot number above threshold fluence. The concurrent growth in depth follows a linear dependence with shot number. The size of the initial damage influences the threshold for growth; the morphology of the initial site depends strongly on the initiating fluence. We have found only a weak dependence on pulse length for growth rate. Low fluence conditioning in air may delay the onset of growth. Most of the work has been on bare substrates but the presence of a sol-gel AR coating has no significant effect.
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Mary A. Norton, Lawrence W. Hrubesh, Zhouling Wu, Eugene E. Donohue, Michael D. Feit, Mark R. Kozlowski, David Milam, Kurt P. Neeb, William A. Molander, Alexander M. Rubenchik, Walter D. Sell, Paul J. Wegner, "Growth of laser-initiated damage in fused silica at 351 nm", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425055; https://doi.org/10.1117/12.425055
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