Influence of the standing-wave electric field pattern on the laser damage resistance of HfO2 thin films

Marco Alvisi; M. Di Giulio; Maria Rita Perrone; Maria Lucia Protopapa; Salvatore Scaglione

doi:10.1117/12.425046

12 April 2001 Influence of the standing-wave electric field pattern on the laser damage resistance of HfO₂ thin films

Marco Alvisi, M. Di Giulio, Maria Rita Perrone, Maria Lucia Protopapa, Salvatore Scaglione

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425046
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

The aim of this work is to investigate the influence of the standing-wave electric field profile on the laser damage resistance of HfO₂ thin films. To this end, HfO₂ thin films of different optical thickness and deposited by the electron beam evaporation technique at the same deposition conditions have been analyzed. Laser damage thresholds of the samples have been measured at 308 nm (XeCl laser) by the photoacoustic beam deflection technique and microscopic inspections. The dependence of the laser damage threshold on the standing-wave electric field pattern has been analyzed.

Citation Download Citation

Marco Alvisi, M. Di Giulio, Maria Rita Perrone, Maria Lucia Protopapa, and Salvatore Scaglione "Influence of the standing-wave electric field pattern on the laser damage resistance of HfO₂ thin films", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425046

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