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12 April 2001 Optical thin films grown by surface chemical reaction for high-power lasers
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Abstract
We developed a novel coating method using chemical reactions of gaseous reactants on a surface. A self-limiting nature of surface chemical reactions allows precisely controlled growth of films with high uniformity and controllability of thickness over large area. The nonuniformity of thickness distribution was under 1% over 240 mm in diameter. The film thickness had proportional relationship with a number of chemical reactions. TiO2 films at growth temperature of 25 degree(s)C had a laser-induced damage threshold of 5 J/cm2 for 1-ns, 1.06-micrometers laser pulses. The laser damage resistance of TiO2 films decreased at higher growth temperature. TiO2 films grown at the high temperature had higher crystallinity. We clarified that the laser damages resulted from the local sites that absorbed the laser energy.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shin-ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, and Tatsuhiko Yamanaka "Optical thin films grown by surface chemical reaction for high-power lasers", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425045
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