12 April 2001 Optical transparency of SiO2 glass in vacuum ultraviolet region and defect formation by F2 laser
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Abstract
Vacuum ultraviolet (vuv) absorption edge and defect formation by F2 excimer laser irradiation in synthetic SiO2 glasses, which have no detectable amount of point defects, were found to be controlled by the physical disorder of the network structure. The vuv edge shifts to a long wavelength side with increasing the fraction of 3- or 4-membered ring structures that are composed of strained Si- O-Si bonds. The defect formation by F2 laser irradiation occurs via one-photon absorption processes and the primarily created defects are a pair of E' center and non-bridging oxygen hole center. The ratio of saturated defect concentrations created by the irradiation is close to that of the fraction of 3- or 4-membered ring structures in the network structure. The present results demonstrate that physical disorder primarily controls the transparency in the vuv regime and damage sensitivity to F2 laser pulse.
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Hideo Hosono, Hideo Hosono, T. Kinoshita, T. Kinoshita, Yoshiaki Ikuta, Yoshiaki Ikuta, K. Kajihara, K. Kajihara, Masahiro Hirano, Masahiro Hirano, } "Optical transparency of SiO2 glass in vacuum ultraviolet region and defect formation by F2 laser", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425069; https://doi.org/10.1117/12.425069
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