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1 February 2001 Application of the scanning Kelvin microscopy for nondestructive material characterization
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Proceedings Volume 4348, Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (2001) https://doi.org/10.1117/12.417638
Event: Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 2000, St. Petersburg, Russian Federation
Abstract
Scanning Kelvin microscopy (SKM) has been applied to the characterization of poled non-linear optical (NLO) polymer films, carbon black filled epoxy polymers and sulfur- passivated GaAs(100). This paper demonstrates that SKM is applicable to the detection of the magnitude and the direction of the field-induced polarization in poled NLO polymer films. We compare the response to that obtained from the scanning second-harmonic-microscopy method in which the direction of the orientation cannot be seen. A local illumination of the GaAs(100) surface during treatment in sodium sulfide solutions has significant influence on the work function distribution on the passivated surface. The image of the lateral distribution of the carbon black electrical network in epoxy resin by SKM is demonstrated.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrej Ivankov, Robert Blum, Torsten Prasse, Jan Sandler, and Wolfang Bauhofer "Application of the scanning Kelvin microscopy for nondestructive material characterization", Proc. SPIE 4348, Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (1 February 2001); https://doi.org/10.1117/12.417638
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