1 February 2001 Optimization of integrated circuit technology
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Proceedings Volume 4348, Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (2001) https://doi.org/10.1117/12.417685
Event: Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 2000, St. Petersburg, Russian Federation
Abstract
Process parameters optimization in device/integrated circuits (IC) technology is an important and essential stage in the modern industrial cycle of the microelectronics industry. The use of the progressive computer and information technique enables to resolve this problem. Algorithms and results are presented for optimization of process parameters from the viewpoint of providing with acceptable deviations of IC devices performances. As input data for optimization we used results of real experiments obtained in industrial conditions. SPICE parameters of n-MOS transistor were analyzed.
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Wieslaw B. Kuzmicz, Wieslaw B. Kuzmicz, Viktor S. Malyshev, Viktor S. Malyshev, Vladislav V. Nelayev, Vladislav V. Nelayev, Viktor R. Stempitsky, Viktor R. Stempitsky, } "Optimization of integrated circuit technology", Proc. SPIE 4348, Fourth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (1 February 2001); doi: 10.1117/12.417685; https://doi.org/10.1117/12.417685
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