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9 April 2001 Continuous image writer with improved image quality for high-accuracy optical patterning
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Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425103
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
We report on the development of a production tool for fast optical maskless patterning. The Continuous Image Writer (CIW) combines the advantages of direct writing by using a programmable mask with the advantages of conventional optical lithography by using the same lithographic process for image formation in photoresist. An electronically programmable Spatial Light Modulator (SLM) is imaged into the substrate by passing a demagnifying Fourier optics. The use of short pulses of a KrF excimer laser allows the imaging of the extended image field of the SLM without stopping the substrate carrying stage during exposure. This results in short writing times. Based on the experiences with a production-like prototype of the CIW we have investigated the various contributions to image quality such as address grid, stitching errors, and SLM quality. This paper describes a method for achieving a critical dimension performance well suited for the generation of photomask and wafer patterns for present and future technology nodes.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg Paufler, Stefan Brunn, and Tim Koerner "Continuous image writer with improved image quality for high-accuracy optical patterning", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); https://doi.org/10.1117/12.425103
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