9 April 2001 Establishment of production processes and assurance method for alternating phase shift masks
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Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425096
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
Alternating phase shift masks (AItPSMs) are effective in reducing MEF. However, AItPSMs have been used in device development, not in production, because phase-defect assurance has not been sufficient. An assurance method for 180- and 150-nm rule A1tPSMs was established by the use of both MD-2000 and KLA/STARlight. We have started production of defect-free AItPSMs with quartz etched shifters and single trench structure s by a two-step quartz etching process, which has an advantage of low phase-defect density.
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Shiaki M. Murai, Yasuhiro Koizumi, Tatsuhiko Kamibayashi, Hidetaka Saitou, Morihisa Hoga, Yasutaka Morikawa, Hiroyuki Miyashita, "Establishment of production processes and assurance method for alternating phase shift masks", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425096; https://doi.org/10.1117/12.425096
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