9 April 2001 High-resolution inspection of 2D microstructures using multimode polarization microscopy
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Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425083
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
For accurate measurements of structures with sharp edges, as found on photomasks and wafers, polarization methods are useful because edges provide a unique polarization-effect: depending on geometrical form and material of the edge, its effect on the incident polarization is different. We have developed three different methods for polarization- utilization: (1) polarization interferometry, (2) Jones- matrix microscopy, and (3) quantitative phase-contrast. All three procedures are incorporated into one set-up. We describe the set-up and its measurement modes.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Totzeck, Harald Jacobsen, Hans J. Tiziani, "High-resolution inspection of 2D microstructures using multimode polarization microscopy", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425083; https://doi.org/10.1117/12.425083
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