9 April 2001 Quality assessment of advanced photomasks using the Q-CAP cluster tool
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Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425084
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
The reduction of wavelength in optical lithography and the use of enhancement techniques like phase shift technology, optical proximity correction (OPC), or off-axis illumination, lead to new specifications for advanced photomasks: a challenge for cost effective mask qualification. `Q-CAP', the Qualification Cluster for Advanced Photomasks, comprising different inspection tools (a photomask defect inspection station, a CD metrology system, a photomask review station and a stepper simulation software tool) was developed to face these new requirements. This paper will show the performance and reliability of quality assessment using the Q-CAP cluster tool for inspection and qualification of photomasks. Special attention is paid to a key issue of mask qualification: the impact of CD deviations, loss of pattern fidelity-- especially for OPC pattern and mask defects on wafer level.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kai Peter, Thomas Schaetz, Volodymyr Ordynskyy, Roman Liebe, Martin Verbeek, Gerald Galan, Emanuele Baracchi, Corinne Miramond, Hans-Juergen Brueck, Gerd Scheuring, Thomas Engel, Yair Eran, Karl Sommer, Hans Hartmann, "Quality assessment of advanced photomasks using the Q-CAP cluster tool", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425084; https://doi.org/10.1117/12.425084
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