7 September 2001 Properties of thin film Si-C-N compositions
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Thin films of selected amorphous and nano-crystalline compositions from the ternary phase diagram made up of carbon, silicon, and nitrogen, with a significant oxygen impurity, have been grown by chemical plasma reactions, ion beam deposition and plasma CVD. Characterization has focused on optical and mechanical properties to determine the compositions best suited for erosion resistant infrared (IR) optical coatings. The most desirable film compositions for the goal application are located in a compositional region around the C/Si atom ratio = 0.2 and C/N = 0.3. The most durable films have no apparent midwave infrared (IR) absorptions, an optical index of refraction ranging from 2 to 2.1, and indent hardness near 40 GPa. Thin film compositions nearer to carbon nitride show significant midwave absorption bands and lower hardness. Ambient thermal oxidation resistance increases with film nitrogen content, with the most durable films being stable at 700 degree(s)C in air.
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Alan B. Harker, Alan B. Harker, Robert J. Ondercin, Robert J. Ondercin, Karen R. Olson, Karen R. Olson, "Properties of thin film Si-C-N compositions", Proc. SPIE 4375, Window and Dome Technologies and Materials VII, (7 September 2001); doi: 10.1117/12.439186; https://doi.org/10.1117/12.439186

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