26 April 2001 Continuum model of shot noise and line edge roughness
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Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425198
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
Decreasing feature size implies increased sensitivity to statistical fluctuations which impact critical dimension uniformity and control. In a recent work Gallatin and Liddle presented equations which describe the basic processes leading to surface and line edge roughness in a chemically amplified resists. Retaining only the lowest order terms in what is inherently a very nonlinear problem they were able to derive a scaling law and other dependencies which show reasonable agreement with experimental data. Here the analysis of the same equations is extended and expanded to include the dominant nonlinear effects.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregg M. Gallatin, Gregg M. Gallatin, } "Continuum model of shot noise and line edge roughness", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425198; https://doi.org/10.1117/12.425198


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