26 April 2001 Fabrication of fluidic manifold systems using single-exposure grayscale masks
Author Affiliations +
Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425210
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
Abstract
Lab-on-a-chip devices are currently being developed at the University of Wales, Bangor. These devices can be used to manipulate and characterize bio-particles suspended in a fluid medium . For precise operation, accurate fluidic transport within these devices is required, for example at channel junctions where flow rates or mixing must be controlled. We present a technique for the production of varying cross-section channels and fluidic manifolds by photolithographic exposure of greyscale masks. This technique is ideally suited to the rapid prototyping and production of lab-on-a-chip devices, since a single exposure system is both faster and simpler than other methods currently available.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher J. Hayden, Christopher J. Hayden, Julian P.H. Burt, Julian P.H. Burt, } "Fabrication of fluidic manifold systems using single-exposure grayscale masks", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425210; https://doi.org/10.1117/12.425210
PROCEEDINGS
7 PAGES


SHARE
Back to Top