26 April 2001 Periodic nanostructure fabrication on the semiconductor monocrystalline surface
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Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425232
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
Abstract
In this work it is shown the possibility of the nano-size periodic structures forming on the surface of semiconductor monocrystals with low reflectivity by means of the intracavity laser processing. For this aim the special laser resonator has been designed, which allows to produce extremely narrow high-quality periodic surface structures, looking as equidistant parallel grooves, micro grids, systems of periodically located micro-craters, as well as nano-size structures of other form. The experiments have shown that this resonator makes it possible to fabricate such nano-size structures on the processed samples of monocrystals of germanium and silicon, which have the Fresnel reflectivity coefficient less than 40 percent.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vasily V. Valyavko, Vladimir P. Osipov, Alexander Mozgo, "Periodic nanostructure fabrication on the semiconductor monocrystalline surface", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425232; https://doi.org/10.1117/12.425232
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