26 April 2001 Simulation-enabled decision making in advanced lithographic manufacturing
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Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425236
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
Abstract
Spatial modeling methods to improve manufacturing implementation and evaluate process capability are described. The basic elements of the simulation environment are developed and applied to answer real world manufacturing questions on process transfer risks, exposure system quality and paths to improving manufacturing performance. The hidden value in process and tool characterization data is leveraged through predictive modeling techniques and the eventual ink of advanced modeling to process control on the manufacturing line is anticipated. This paper is written in survey fashion offering examples, suggestions and references for those interested in developing or improving a simulation infrastructure for lithographic manufacturing.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher J. Progler, Christopher J. Progler, } "Simulation-enabled decision making in advanced lithographic manufacturing", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425236; https://doi.org/10.1117/12.425236
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