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20 April 2001 Some measurements on the effects of developer depletion
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Proceedings Volume 4405, Process and Equipment Control in Microelectronic Manufacturing II; (2001) https://doi.org/10.1117/12.425249
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
Abstract
This work describes assessment of `long range' and `short range' developer depletion using production and test reticles respectively. Long range developer depletion refers to the case where development of large unpatterned field areas remote from critical dimensions influences their size, whether the field areas are exposed or unexposed. Results show no significant effect at the 0.35 micron scale. Short range developer depletion refers to the case, on test reticles, where single lines are defined in large open field areas or in a small open box set within a dark field area. Differences in CD's can be readily measured on test reticles and attributed to the effects of developer depletion.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Martin and Tom Tighe "Some measurements on the effects of developer depletion", Proc. SPIE 4405, Process and Equipment Control in Microelectronic Manufacturing II, (20 April 2001); https://doi.org/10.1117/12.425249
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