30 April 2001 Computational synthesis of lithographic mask layouts for silicon microcomponents
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Proceedings Volume 4407, MEMS Design, Fabrication, Characterization, and Packaging; (2001) https://doi.org/10.1117/12.425292
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom
In order to efficiently design complex micromechanical systems there is a growing demand for layout synthesis tools that directly derive the layout description from the device description. This paper outlines a systematic method of using genetic algorithms to synthesize the lithographic mask layout of micromachined silicon devices. The procedure has been implemented in the computer program OMEA, which calculates an optimal or semi-optimal layout description from the three-dimensional device description of the component. Currently, this method is applied to chemical deep etching of silicon. To model the structuring process the program makes use of a coupled etch simulator. Synthesis results show that the design engineer is enabled to take full advantage of the possible design space of the underlying process technology. The tool is an integrated part of the CAD environment BICEPS. In order to demonstrate the capability of the concept the design process of a spring actuator is described in detail.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephanus Buettgenbach, Stephanus Buettgenbach, Ulli Hansen, Ulli Hansen, Lars Steffensen, Lars Steffensen, } "Computational synthesis of lithographic mask layouts for silicon microcomponents", Proc. SPIE 4407, MEMS Design, Fabrication, Characterization, and Packaging, (30 April 2001); doi: 10.1117/12.425292; https://doi.org/10.1117/12.425292

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