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5 September 2001 Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438361
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
As the wafer design rule is getting smaller, the size and transmittance of the defect on the reticle, especially for the semi-transparent defect, is one of the important factors to be controlled in mask shop. In order to minimize controversy for the accuracy of size and transmittance measurement, we need to define the detection and measurement ability of each inspection machine for the half-tone defect. In this work, we make semi-transparent defects with FIB repair tool, SEIKO, and treat this plate with NaOH. We first investigate the delectability of each inspection machine for the semi-transparent defects according to the size and transmittance increase and accuracy of size measuring tool supported in each inspection machine, KLA, lasertec and ORBOT. We verify the measurement result with CD SEM for the size and AIMS for the transmittance.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jung-Bae Kim, I. B. Hur, Seong-Ho Jeong, Yong-Seok Son, Kyu-Yong Lee, Sang Woon Lee, Cheol Shin, and Hong-Seok Kim "Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438361
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