5 September 2001 Advanced FIB mask repair technology for ArF lithography: III
Author Affiliations +
Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438373
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
The design rule of the semiconductor devices is getting dramatically tighter as the progress of lithography technology. Photomask is a key factor to support the lithography technology. Defect repairing technology becomes more important than ever for keeping the photomasks' integrity in the manufacturing processes. When using conventional FIB, however, there are issues of transmission loss due to riverbed and gallium stain for opaque defect repairs as well as the problem raised by halo around repair areas for clear defect repairs. Because of these issues, it is necessary to develop the new FIB mask repairing system for 130nm node. We have been developing the new FIB mask repair system since 1998 and have been testing the repairing performance. The results were published at both PMJ2000 and BACUS2000. This time, we introduce the prototype system's outline, and report preliminary data of imaging damage and repair accuracy for the first time in public.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryoji Hagiwara, Ryoji Hagiwara, Anto Yasaka, Anto Yasaka, Osamu Takaoka, Osamu Takaoka, Tomokazu Kozakai, Tomokazu Kozakai, S. Yabe, S. Yabe, Yoshihiro Koyama, Yoshihiro Koyama, Masashi Muramatsu, Masashi Muramatsu, Toshio Doi, Toshio Doi, Kenji Suzuki, Kenji Suzuki, Mamoru Okabe, Mamoru Okabe, Kazuo Aita, Kazuo Aita, Tatsuya Adachi, Tatsuya Adachi, Shinji Kubo, Shinji Kubo, Nobuyuki Yoshioka, Nobuyuki Yoshioka, Hiroaki Morimoto, Hiroaki Morimoto, Yasutaka Morikawa, Yasutaka Morikawa, Kazuya Iwase, Kazuya Iwase, Naoya Hayashi, Naoya Hayashi, } "Advanced FIB mask repair technology for ArF lithography: III", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438373; https://doi.org/10.1117/12.438373

Back to Top