5 September 2001 First performance data obtained on next-generation optical mask metrology tools
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438331
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
To keep pace with continuously shrinking design rules for masks and reticles Leica Microsystems has developed two new mask metrology tools. The LWM 250 DUV is designed to measure Critical Dimensions (CD) on mask in transmitted light at 248nm illumination. The LMS IPR02 is designed to measure pattern placement and CDs in transmitted light at I- line (365nm) illumination. System overview and first performance data are presented for both tools. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved edge detection and CD linearity compared to systems using white light or I-line illumination for imaging.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus-Dieter Roeth, Klaus-Dieter Roeth, Carola Blaesing-Bangert, Carola Blaesing-Bangert, Herger Alt, Herger Alt, Gerhard W.B. Schlueter, Gerhard W.B. Schlueter, } "First performance data obtained on next-generation optical mask metrology tools", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438331; https://doi.org/10.1117/12.438331
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