5 September 2001 Improvement of NLD mask dry etching system
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438356
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
An advanced photomask dry etching system (NLDE-9035) has been evaluated. The NLD plasma has an advantage to have a capability to control the plasma distribution and density. In our previous work, it has been confirmed to obtain excellent CD uniformity, CD linearity and good pattern fidelity. To improve the CD uniformity further, the neutral loop modulation etching technique has been evaluated. As a result, a further improvement of CD uniformity has been confirmed by using neutral loop (NL) diameter modulation etching technique.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuya Fujisawa, Tatsuya Fujisawa, Nobuyuki Yoshioka, Nobuyuki Yoshioka, Takaei Sasaki, Takaei Sasaki, Kazuhide Yamashiro, Kazuhide Yamashiro, } "Improvement of NLD mask dry etching system", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438356; https://doi.org/10.1117/12.438356
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