Translator Disclaimer
Paper
5 September 2001 Photomask quality control by Virtual Stepper system for subwavelength photomasks
Author Affiliations +
Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438362
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
This work demonstrates the capability of the Virtual Stepper System software tool to evaluate sub-wavelength photo mask quality. A comparison of the results produced by the Virtual Stepper and conventional hardware (AIMS) inspection tools was made. At perfect focus the results are similar, but the results differ wen defocus is considered. Upon investigating this difference a hypothesis was made and then tested using a computer model which confirmed the presence of lens aberrations in the AIMS system.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Linard Karklin and Stan Mazor "Photomask quality control by Virtual Stepper system for subwavelength photomasks", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438362
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top