5 September 2001 Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438402
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
Sigma7100 is a revolutionary new architecture for Laser Pattern Generators being developed by Micronic Laser Systems. The Sigma7100 system design uses a unique architecture based on a spatial light modulator (SLM), a MEMS consisting of a 1 million pixel micro-mirror array fabricated onto a CMOS substrate. The SLM functions as a dynamic mask which is illuminated by a 1kHz DUV excimer laser. A new pattern is calculated and downloaded into the SLM for each laser pulse, and the resultant SLM image is then projected on to the mask substrate. This paper describes the Sigma7100 architecture, presents recent results, and presents a look into the path toward extending the SLM technology to the 70nm node and beyond.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Torbjoern Sandstrom, Timothy I. Fillion, Ulric B. Ljungblad, Mats Rosling, "Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438402; https://doi.org/10.1117/12.438402
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