17 April 2001 Enhancement of the electrophotographic sensitivity of amorphous selenium films using a PVK polymer barrier layer
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Abstract
X-ray sensitivity of amorphous selenium (a-Se films approximately 130 micrometers ) has been studied as a function of thickness (approximately 2400A to 7500A) of polyvinyl carbazole (PVK) interface barrier layer using the potential decay technique. The films show maximum sensitivity when incorporated with barrier layer of thickness approximately 7500A. This has been attributed to the blocking, trapping and field enhanced mobility role of the PVK interface barrier layer.
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S. Chand, S. Chand, G. D. Sharma, G. D. Sharma, S. Dwivedi, S. Dwivedi, A. Agarwal, A. Agarwal, E. S. R. Gopal, E. S. R. Gopal, } "Enhancement of the electrophotographic sensitivity of amorphous selenium films using a PVK polymer barrier layer", Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); doi: 10.1117/12.425456; https://doi.org/10.1117/12.425456
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