14 September 2001 Fabrication of capillary electrophoresis (CE) microchip in polydimethylsiloxane
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Proceedings Volume 4414, International Conference on Sensor Technology (ISTC 2001); (2001) https://doi.org/10.1117/12.440224
Event: International Conference on Sensing units and Sensor Technology, 2001, Wuhan, China
Abstract
In this article, we introduce a kind of capillary electrophoresis microchip in PDMS. This paper describes the procedure to design and fabricate channels in an elastomeric material - PDMS> The format of the capillary electrophoresis microchip is converted into a transparency, which serves as the photomask in contact photolithography to produce a SU-8 positive relief photoresist on silicon wafer. PDMS cast against the master yield s a replica contain ga network of channels, which are 200(Mu) m wide and 200micrometers deep. After the surface of this replica and a glass substrate being fabricated with the gold down-leads are oxidized in oxygen plasma, the two cured surfaces are brought into conformal contact and the capillary electrophoresis microchip is gotten.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ming Wang, Ming Wang, Dafu Cui, Dafu Cui, Li Wang, Li Wang, Xiang Chen, Xiang Chen, Feng Teng, Feng Teng, } "Fabrication of capillary electrophoresis (CE) microchip in polydimethylsiloxane", Proc. SPIE 4414, International Conference on Sensor Technology (ISTC 2001), (14 September 2001); doi: 10.1117/12.440224; https://doi.org/10.1117/12.440224
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