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14 September 2001 Machine for electrochemical etch stop
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Proceedings Volume 4414, International Conference on Sensor Technology (ISTC 2001); (2001) https://doi.org/10.1117/12.440238
Event: International Conference on Sensing units and Sensor Technology, 2001, Wuhan, China
Abstract
The configurations of electrochemical silicon etch-stop are discussed in this paper. An electrochemical etching machine with software and hardware, which can control the etching process of silicon very well, is designed and fabricated bas don the theory of electrochemical etching. Accurate etching temperature is obtained by modified integral algorithm of PID presented in temperature control in software. With an algorithm presented in control of etch-stop, the tech-stop point can be detected according to the characteristics of p- n junction current-time in electrochemical etching. The machine with hardware including S/H, controller and actuator can adapt to all wet etching configurations such as poly- electrode electrochemical etch-stop.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kun Zhou, Mujie Lan, Weiping Chen, and Donghong Wang "Machine for electrochemical etch stop", Proc. SPIE 4414, International Conference on Sensor Technology (ISTC 2001), (14 September 2001); doi: 10.1117/12.440238; https://doi.org/10.1117/12.440238
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