8 May 2001 In-situ single-wavelength ellipsometer for a vacuum chamber
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Proceedings Volume 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001); (2001) https://doi.org/10.1117/12.426993
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '01), 2001, Yokohama, Japan
Abstract
We have developed an in-situ single wavelength ellipsometer applicable to a vacuum sputter to monitor ellipsometric parameters during thin film deposition. The translation and tilting stages in the polarizer and analyzer make it easy to adjust optical axis and the angle of incidence. To calibrate inherent offset in the azimuth axis of the polarizer and analyzer, regression and residual calibration procedures are conducted. This work also includes the measurement results of the silver target deposition on the alloy, made of chrome and nickel, and silicon wafers. The manufactured ellipsometer will be used to investigate optical properties of the thin film and substrate in the vacuum state with various temperature ranges.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Won Chegal, Sangheon Ye, Hyun-Mo Cho, Yoonwoo Lee, Soo Hyun Kim, Yoon Keun Kwak, "In-situ single-wavelength ellipsometer for a vacuum chamber", Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); doi: 10.1117/12.426993; https://doi.org/10.1117/12.426993
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