25 September 2001 Rough alignment system using moire gratings for lithography
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Proceedings Volume 4417, Photonics 2000: International Conference on Fiber Optics and Photonics; (2001) https://doi.org/10.1117/12.441354
Event: Photonics 2000: International Conference on Fiber Optics and Photonics, 2001, Calcutta, India
Abstract
Some types of rough alignment system for pre-alignment of precise alignment is proposed. One is a system using wide pitch gratings, with narrow pitch gratings for precise alignment. The other is a system using only narrow pitch gratings with small slit number, which is simple in construction. The operations are discussed on the basis of the results of computer simulation.
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Hideo Furuhashi, Hideo Furuhashi, Masayuki Uchida, Masayuki Uchida, Yoshiyuki Uchida, Yoshiyuki Uchida, Vijay Trimbak Chitnis, Vijay Trimbak Chitnis, } "Rough alignment system using moire gratings for lithography", Proc. SPIE 4417, Photonics 2000: International Conference on Fiber Optics and Photonics, (25 September 2001); doi: 10.1117/12.441354; https://doi.org/10.1117/12.441354
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