Physical effects of evaporated materials in thin films and emission patterns

G. Galvez; Guillermo Baldwin-Olguin; Francisco Villa

doi:10.1117/12.437133

14 August 2001 Physical effects of evaporated materials in thin films and emission patterns

G. Galvez, Guillermo Baldwin-Olguin, Francisco Villa

Proceedings Volume 4419, 4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications; (2001) https://doi.org/10.1117/12.437133
Event: IV Iberoamerican Meeting of Optics and the VII Latin American Meeting of Optics, Lasers and Their Applications, 2001, Tandil, Argentina

Abstract

The present work studies the refraction index and physical thickness variation of deposited thin films over large glass substrates and source emission patterns variation, exclusively due to the type of material in the evaporation process at high vacuum. The employed method consists in varying the evaporated material and so obtaining the thin films physical thickness and refraction index in several points over the substrate through adjustment of the measured transmittance, comparing with the one obtained by simulation. The results show a radial distribution of the refraction index and physical thickness in dielectric thin films due to the material employed.

Citation Download Citation

G. Galvez, Guillermo Baldwin-Olguin, and Francisco Villa "Physical effects of evaporated materials in thin films and emission patterns", Proc. SPIE 4419, 4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications, (14 August 2001); https://doi.org/10.1117/12.437133

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