14 August 2001 Physical effects of evaporated materials in thin films and emission patterns
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Proceedings Volume 4419, 4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications; (2001) https://doi.org/10.1117/12.437133
Event: IV Iberoamerican Meeting of Optics and the VII Latin American Meeting of Optics, Lasers and Their Applications, 2001, Tandil, Argentina
Abstract
The present work studies the refraction index and physical thickness variation of deposited thin films over large glass substrates and source emission patterns variation, exclusively due to the type of material in the evaporation process at high vacuum. The employed method consists in varying the evaporated material and so obtaining the thin films physical thickness and refraction index in several points over the substrate through adjustment of the measured transmittance, comparing with the one obtained by simulation. The results show a radial distribution of the refraction index and physical thickness in dielectric thin films due to the material employed.
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G. Galvez, G. Galvez, Guillermo Baldwin-Olguin, Guillermo Baldwin-Olguin, Francisco Villa, Francisco Villa, "Physical effects of evaporated materials in thin films and emission patterns", Proc. SPIE 4419, 4th Iberoamerican Meeting on Optics and 7th Latin American Meeting on Optics, Lasers, and Their Applications, (14 August 2001); doi: 10.1117/12.437133; https://doi.org/10.1117/12.437133
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