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26 June 2001 Laser ablation of the thin film by thermal tension
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Proceedings Volume 4423, Nonresonant Laser-Matter Interaction (NLMI-10); (2001) https://doi.org/10.1117/12.431227
Event: Nonresonant Laser-Matter Interaction (NLMI-10), 2000, St. Petersburg, Russian Federation
Abstract
The process of laser ablation of the thin film in solid or liquid phase in the before-evaporation regime is considered. The physical model of film ablation caused by thermal tension, occurring in the film by its fast laser heating, is proposed. The dependence of velocity of film fragment movement of the substrate surface on laser intensity is defined. The prosed conception of laser film ablation is used to explain the phenomenon of film degradation. The obtained results are in a good agreement with known experimental data.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elena A. Shakhno "Laser ablation of the thin film by thermal tension", Proc. SPIE 4423, Nonresonant Laser-Matter Interaction (NLMI-10), (26 June 2001); https://doi.org/10.1117/12.431227
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