New mechanism of laser dry cleaning

Boris S. Luk'yanchuk; Yuan Wei Zheng; Yongfeng Lu

doi:10.1117/12.431213

26 June 2001 New mechanism of laser dry cleaning

Boris S. Luk'yanchuk, Yuan Wei Zheng, Yongfeng Lu

Proceedings Volume 4423, Nonresonant Laser-Matter Interaction (NLMI-10); (2001) https://doi.org/10.1117/12.431213
Event: Nonresonant Laser-Matter Interaction (NLMI-10), 2000, St. Petersburg, Russian Federation

Abstract

The dry laser cleaning arises due to thermal expansion of the substrate and/or particle, when the corresponding acceleration force produces work sufficient to overcome the adhesion energy. The previous examinations of the dry cleaning were done for two mechanisms: 1) expansion of absorbing particle on the transparent substrate and 2) expansion of the absorbing substrate with non-absorbing particle. Nevertheless using model with conventional mechanism based on the 1D surface expansion, one can find threshold fluence by the order of magnitude higher than experimental one. In the present paper, we discuss the new mechanism for situation when the particle is heated due to thermal contact with substrate, and additional thermo deformation effect, caused by optical enhancement. It is shown that these effects can be responsible for relatively small threshold fluence for laser cleaning of SiO₂ particles from the surface of Si by ns-excimer laser pulse.

Citation Download Citation

Boris S. Luk'yanchuk, Yuan Wei Zheng, and Yongfeng Lu "New mechanism of laser dry cleaning", Proc. SPIE 4423, Nonresonant Laser-Matter Interaction (NLMI-10), (26 June 2001); https://doi.org/10.1117/12.431213

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