Paper
12 June 2001 Application of reactivity atmospheres to purification of silica glass during its synthesis by colloidal sol-gel method
Barbara Janoszczyk, Jan Wojcik, Mariusz Makara, Witold Spytek
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Proceedings Volume 4425, Selected Papers from the International Conference on Optoelectronic Information Technologies; (2001) https://doi.org/10.1117/12.429739
Event: International Conference on Optoelectronic Information Technologies, 2000, Vinnytsia, Ukraine
Abstract
This work presents results of purification process investigations from undesirable contaminations as iron, copper etc. oxides of porous preforms from SiO2 at utilization of different chlorine components in high temperatures. We defined sources of undesirable contaminations during silica glass synthesis by colloidal sol-gel methods. We calculated equilibrium constants of chemical reactions of transient element oxides with three different chlorinating agents under high temperature conditions. Then we examined possibilities of removing these contaminations. Results of presented investigations permit on projecting variant of colloidal sol- gel method making possible receipt glass about optical fiber purity.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Barbara Janoszczyk, Jan Wojcik, Mariusz Makara, and Witold Spytek "Application of reactivity atmospheres to purification of silica glass during its synthesis by colloidal sol-gel method", Proc. SPIE 4425, Selected Papers from the International Conference on Optoelectronic Information Technologies, (12 June 2001); https://doi.org/10.1117/12.429739
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