12 June 2001 Filmforming materials for IR optics and optoelectronics
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Proceedings Volume 4425, Selected Papers from the International Conference on Optoelectronic Information Technologies; (2001) https://doi.org/10.1117/12.429746
Event: International Conference on Optoelectronic Information Technologies, 2000, Vinnytsia, Ukraine
Abstract
Filmforming materials for IR optics and optoelectronics based on the complex oxides, chalcogenides and fluorides were proposed. The urgent problem is to eliminate new opportunities on the improvement of the conventional filmforming materials and to promote new filmforming materials with less toxicity or of high ecological security. The achromatic transparent coats with improved transparency in the IR spectral range (2 - 12 micrometer) were prepared using new filmforming materials on the base of complex fluorides with low absorption level and complex sulphides of the spinel type. The filmforming materials for the coat with the enhanced durability for interference light-fillers or spectrum-divisors in the range of 1 - 2.5 micrometer on the base of ZnS-Ge and cryolite type systems as well as filmforming materials for the coats for He- Ne laser mirrors with low losses of radiation energy on the base of binary and complex RE and d-metals oxides were developed. The concept of teleological forecasting, methods and technologies of synthesis filmforming materials were proposed.
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Victor F. Zinchenko, Ninel' P. Efryushina, Grygoriy Kocherba, Valeri P. Sobol, "Filmforming materials for IR optics and optoelectronics", Proc. SPIE 4425, Selected Papers from the International Conference on Optoelectronic Information Technologies, (12 June 2001); doi: 10.1117/12.429746; https://doi.org/10.1117/12.429746
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