25 February 2002 Characterization of fused silica ablation by F2-KrF excimer laser multiwavelength excitation process
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Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456895
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore
Abstract
The novel technique for high-quality ablation and high- efficiency refractive index modification of fused silica by VUV-UV multiwavelength excitation process has been developed, in which both of the commercially available F2 and KrF excimer lasers are simultaneously irradiated to the sample. The high-quality ablation is ascribed to absorption of KrF excimer laser by excited states formed by F2 laser (excited-state absorption mechanism). Dependences of ablation rate on KrF excimer laser fluence at three deferent F2 laser fluences and irradiation timing of each laser beam are investigated. The multiwavelength excitation process is also applied for effective refractive index change. The multiwavelength excitation process achieves twice of diffraction efficiency compared with single wavelength irradiation of F2 laser at same number of incident total photon number. This is caused by the resonance photoionization-like process through the excited state.
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Kotaro Obata, Kotaro Obata, Koji Sugioka, Koji Sugioka, Toshimitsu Akane, Toshimitsu Akane, Naoko Aoki, Naoko Aoki, Koichi Toyoda, Koichi Toyoda, Katsumi Midorikawa, Katsumi Midorikawa, } "Characterization of fused silica ablation by F2-KrF excimer laser multiwavelength excitation process", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456895; https://doi.org/10.1117/12.456895
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