25 February 2002 Modeling of chemical and mechanical aspects in laser restoration of artworks
Author Affiliations +
Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456809
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore
Abstract
In this paper, investigation of photochemical and photomechanical effects induced in polymer substrates under pulsed UV ablation is presented. The examined laser parameters are the wavelength at 248 nm and 193 nm in the nanosecond regime, and the fluence below and above the ablation threshold. The two polymeric substrates used are PMMA and blends of PMMA and PS.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Costas Fotakis, Costas Fotakis, Athanassia Athanassiou, Athanassia Athanassiou, Efi Andreou, Efi Andreou, Vivi Tornari, Vivi Tornari, Antonia Bonarou, Antonia Bonarou, Laura Antonucci, Laura Antonucci, Dmitrios Anglos, Dmitrios Anglos, Savas K. Georgiou, Savas K. Georgiou, Vassilis Zafiropulos, Vassilis Zafiropulos, } "Modeling of chemical and mechanical aspects in laser restoration of artworks", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456809; https://doi.org/10.1117/12.456809
PROCEEDINGS
6 PAGES


SHARE
Back to Top